Varian High-Vacuum Electron Beam Evaporator - 3117 E-Beam Evaporator High Vacuum Electron Beam Evaporator

High-Vacuum Electron Beam Evaporator systems are used for fabrication of single and multi-layer thin film specimens. One system has three independent sources and is used for deposition of single and multi-layer thin films of materials ranging from lower melting metals, such as aluminum, silver, and copper, up to refractory metals including ruthenium, iridium, and tungsten. The second system, has two independent sources, each capable of depositing as many as six different materials in a single deposition run. With its two-axis, computer-controlled specimen shutter, this system is used for the fabrication of combinatorial layered as well as compositionally graded specimens.