Sputtering is used extensively in the semiconductor industry to deposit thin films of various metal and oxide materials. Thin anti-reflection coatings on glass for optical applications are also deposited by sputtering, because of the low substrate temperatures used.
The PaxScan 4030R is an advanced 40 x 30 cm (16 x 12 inch) digital imaging subsystem, incorporating a flat panel amorphous silicon sensor array, power supply and all interconnecting cables. The low noise electronics of the PaxScan 4030R yields a very high signal-to-noise ratio. All components are designed to provide maximum reliability. Varian ViVA™ user application software included.
Plasma Source Ion Implantation (PSII) is a process by which ions are accelerated to a target at energies high enough to bury them below the target's surface. Depending on the application, the acceleration energies can range from a few keV to MeV. PSII places the target inside the ion source itself. No ion beam is extracted and none needs to be manipulated or focused.
The Accelerator Mass Spectrometer (AMS) facility makes use of the upgraded Tandem Accelerator Laboratory at iThemba LABS (Gauteng). The beam optics and computer-control system allows for measurements with high precision that will contribute to the solution of a wide range of problems.