AJA International Sputter Coater Sputter Coater
The equipment can be used to deposit thin films on various substrates. The equipment deposits thin films by creating a gaseous plasma from argon and then accelerating thae Ar ions onto a substrate (target) which one wants to deposit. On hitting the substrate, atoms or molecules of the substrate are eject and travel in a straight line to the sample to be coated. An energy source (2 DC and 1 RF for this machine) is used to maintain the plasma. The machine uses both DC and magnetron sputtering.
Contact Person/s
Grantholder
Title: Prof
First Name: OM
Last Name: Ndwandwe
Phone: +27 35-902-6563
Email: omndwand@pan.uzulu.ac.za
First Name: OM
Last Name: Ndwandwe
Phone: +27 35-902-6563
Email: omndwand@pan.uzulu.ac.za
